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G. Karbasian,
P. Fay
, H. G. Xing, D. Jena, A. Orlov, and G. Snider,
"
High aspect ratio features in PMGI using electron beam lithography and solvent developers
"
Journal Vacuum Science Technology B, 30, 06FI01, Aug. 2012
Electron beams
Negative resistance
Polymers
Solvents
Ultrasonics
Aug. 2012